发明名称 |
Electron beam exposure device with scanning electron microscope |
摘要 |
The device includes a main control unit (401), an electron gun, a beam deflection amplifier (209), a secondary-electron detector, a digitiser (207) and an image memory (204). A first selector (210) connects the digitiser to either the output (2B) of the deflection amplifier (for checking) or the secondary-electron detection signal (2A). A second selector (211) connects the image memory to either the data bus (205) or an image convertor (203) driving a display unit (102). When the scanning electron microscope (SEM) is functioning the memory temporarily stores the secondary-electron signal in digital form.
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申请公布号 |
DE19720228(A1) |
申请公布日期 |
1997.11.20 |
申请号 |
DE19971020228 |
申请日期 |
1997.05.14 |
申请人 |
ADVANTEST CORP., TOKIO/TOKYO, JP |
发明人 |
IHARA, TOSHIYUKI, TOKIO/TOKYO, JP |
分类号 |
H01J37/305;H01J37/28;H01J37/304;H01L21/027;(IPC1-7):H01J37/304 |
主分类号 |
H01J37/305 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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