发明名称 THIN FILM DEVICE HAVING COATING FILM, LIQUID CRYSTAL PANEL, ELECTRONIC APPARATUS AND METHOD OF MANUFACTURING THE THIN FILM DEVICE
摘要 <p>Liquid is applied and subjected to a heat treatment to form one thin film among an insulating thin film, a silicon thin film and a conductive thin film constituting a TFT. A substrate is spin-coated with the liquid which contains a thin film component and is supplied from the coating liquid storing part (105) of a spin-coater (102). The substrate to which the coating liquid is applied is subjected to a heat treatment by a heat treatment unit (103) to form a coating film on the substrate. If, further, the coating film is subjected to laser annealing, etc., one of the film qualities, crystallinity, denseness and adhesion is improved. If the coating liquid or resist is applied by an ink-jet method, the utilization efficiency of coating liquid can be improved and, further, a patterned coating film can be formed. A thin film device which is low in cost and has a high throughput can be obtained. By manufacturing TFTs with a manufacturing apparatus having the high utilization efficiency of the coating liquid, the initial investment and the cost of a liquid crystal display are significantly reduced.</p>
申请公布号 WO9743689(A1) 申请公布日期 1997.11.20
申请号 WO1997JP01618 申请日期 1997.05.14
申请人 SEIKO EPSON CORPORATION;YUDASAKA, ICHIO;SHIMODA, TATSUYA;KANBE, SADAO;MIYAZAWA, WAKAO 发明人 YUDASAKA, ICHIO;SHIMODA, TATSUYA;KANBE, SADAO;MIYAZAWA, WAKAO
分类号 G02F1/1368;G02F1/1333;G02F1/1362;H01L21/20;H01L21/205;H01L21/225;H01L21/288;H01L21/31;H01L21/3205;H01L21/336;H01L21/768;H01L21/77;H01L21/84;H01L27/12;H01L29/786;(IPC1-7):G02F1/136;B05C5/00;G02F1/133;C01G19/00;G02F1/134 主分类号 G02F1/1368
代理机构 代理人
主权项
地址