| 摘要 |
A system for measuring an amount of microroughness of a surface of a substrate (21), wherein a first beam (44) of electromagnetic radiation and a second beam (46) of electromagnetic radiation are generated, the first (44) and second (46) beams being substantially parallel and spaced apart from each other so that the first (44) and second (46) beams are substantially non-overlapping, and the first (44) and second (46) beams are focused onto the substrate (21) so that the beams impinge upon a selected area of the surface of the substrate (21) having a surface contour, the surface contour of the substrate (21) causing a scattering of both beams. The scattering of the first and second beams is detected, the amount of scattering corresponding to a microroughness value of the selected area of the substrate (21), and the microroughness value of the selected area of the substrate is determined from the amount of scattering of the first (44) and second (46) beams. The microroughness measuring system may also be used for controlling a fabrication process.
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