Coils for generating a plasma and for sputtering

摘要

A sputtering coil for a plasma chamber (100) in a semiconductor fabrication system is provided. The sputtering coil (104) couples energy into a plasma and also provides a source of sputtering material to be sputtered onto a workpiece (112) from the coil to supplement material being sputtered from a target (110) onto the workpiece. Alternatively a plurality of coils may be provided, one primarily for coupling energy into the plasma and the other primarily for providing a supplemental source of sputtering material to be sputtered on the workpiece.