发明名称 |
Inductively coupled RF plasma reactor having an overhead solenoidal antenna |
摘要 |
The invention is embodied in an inductively coupled RF plasma reactor including a reactor chamber enclosure defining a plasma reactor chamber (40) and a support (54) for holding a workpiece (56) inside the chamber, a non-planar inductive antenna (42) adjacent the reactor chamber enclosure, the non-planar inductive antenna including inductive elements (44) spatially distributed in a non-planar manner relative to a plane of the workpiece to compensate for a null in an RF inductive pattern of the antenna, and a plasma source RF power supply (68) coupled to the non-planar inductive antenna. The planar inductive antenna (42) may be symmetrical or non-symmetrical, although it preferably includes a solenoid winding such as a vertical stack of conductive windings. In a preferred embodiment, the windings are at a minimum radial distance from the axis of symmetry while in an alternative embodiment the windings are at a radial distance from the axis of symmetry which is a substantial fraction of a radius of the chamber. <IMAGE> |
申请公布号 |
EP0807953(A1) |
申请公布日期 |
1997.11.19 |
申请号 |
EP19970303244 |
申请日期 |
1997.05.13 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
COLLINS, KENNETH S.;RICE, MICHAEL;TROW, JOHN;BUCHBERGER, DOUGLAS;RODERICK, CRAIG A. |
分类号 |
H05H1/46;B01D53/22;B01D53/26;C23C16/517;C23F4/00;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H01L21/311;H01L21/683 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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