发明名称 Mask holder for a flat panel exposure device
摘要 <p>The mask plate support structure is used in a photoetching installation having a fixed horizontal frame (10) and the support structure is attached to a rectangular mask plate (14) for maintaining the plate in the horizontal plane. The plate holds a glass cover (16). A command mechanism (24) allows the support structure to be attached to the mask plate. Displacement mechanisms (20,22) give movement in two planes. These mechanisms include motors associated with control circuits having memories storing angle values, with the motors controlling X-Y movement of support table structures.</p>
申请公布号 EP0807855(A1) 申请公布日期 1997.11.19
申请号 EP19970401067 申请日期 1997.05.14
申请人 AUTOMA-TECH 发明人 SOREL, ALAIN;CHARBONNIER, SERGE
分类号 G03F7/20;G03F9/00;H05K3/00;(IPC1-7):G03F9/00 主分类号 G03F7/20
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