发明名称 EXPOSURE METHOD, EXPOSURE DEVICE AND MASK
摘要 <p>PROBLEM TO BE SOLVED: To reduce a difference between unnatural contrasts, which are generated in the joint parts in a first and a second layers, by a method wherein when the exposure pattern of the second layer is formed, the joint part in the first layer and the joint part in the second layer are shifted from each other and are exposed. SOLUTION: A joint part JN3 in a first layer Y11 and a joint port JN13 in a second layer LY12 are shifted from each other by the amount (d) of shift and are formed, whereby a second region AR2, whereon a unit pattern C1 of the layer Y11 and a unit pattern D2 of the layer LY12 are overlapped, is formed in a width (d) between a first and a third regions AR1 and AR3. In this region AR2, the pattern C1 of the layer LY11 is shifted from its targeting exposure position by +Δx and is exposed and to this, the pattern D2 of the layer LY12 is shifted from its targeting exposure position by +Δx and is exposed. As a result, the superposition accuracy of the layers LY11 and LY12 in the region AR2 is 0.</p>
申请公布号 JPH09298155(A) 申请公布日期 1997.11.18
申请号 JP19960139429 申请日期 1996.05.08
申请人 NIKON CORP 发明人 TSUCHIYA MAKOTO;NARA KEI;FUJIMORI NOBUTAKA;TOGUCHI MANABU
分类号 G02F1/136;G02F1/1368;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G02F1/136
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