发明名称 Method of making a trench mosfet with heavily doped delta layer to provide low on-resistance
摘要 In a vertical trench MOSFET, a layer of increased dopant concentration is formed in a lightly-doped or "drift" region which separates the body region from the drain region of the MOSFET. The layer of increased dopant concentration denominated a "delta" layer, operates to spread out the current as it emerges from the channel of the MOSFET and thereby reduces the resistance of the MOSFET when it is turned on.
申请公布号 US5688725(A) 申请公布日期 1997.11.18
申请号 US19950482357 申请日期 1995.06.06
申请人 SILICONIX INCORPORATED 发明人 DARWISH, MOHAMED N.;WILLIAMS, RICHARD K.
分类号 H01L21/336;H01L29/08;H01L29/10;H01L29/78;(IPC1-7):H01L21/265;H01L21/44;H01L21/48 主分类号 H01L21/336
代理机构 代理人
主权项
地址