发明名称 |
Method of making a trench mosfet with heavily doped delta layer to provide low on-resistance |
摘要 |
In a vertical trench MOSFET, a layer of increased dopant concentration is formed in a lightly-doped or "drift" region which separates the body region from the drain region of the MOSFET. The layer of increased dopant concentration denominated a "delta" layer, operates to spread out the current as it emerges from the channel of the MOSFET and thereby reduces the resistance of the MOSFET when it is turned on.
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申请公布号 |
US5688725(A) |
申请公布日期 |
1997.11.18 |
申请号 |
US19950482357 |
申请日期 |
1995.06.06 |
申请人 |
SILICONIX INCORPORATED |
发明人 |
DARWISH, MOHAMED N.;WILLIAMS, RICHARD K. |
分类号 |
H01L21/336;H01L29/08;H01L29/10;H01L29/78;(IPC1-7):H01L21/265;H01L21/44;H01L21/48 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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