| 摘要 |
PROBLEM TO BE SOLVED: To provide an EL element minimized in resistance by electrode and free from unevenness of emission luminance by forming one electrode on the whole surface, and arranging the other electrode in dot form. SOLUTION: An electrode 12 is formed on the whole surface of a base 10 by evaporation, flush evaporation, sputtering, and other vacuum thin film forming techniques, and an EL material 14 is further formed on the whole surface by the same technique. A dot electrode 16 is formed as a matrix of dots by use of Al, Mg, Li, Ag, Ln or the like, and before or after the formation, an insulating protecting film 20 is formed by vacuum thin film forming technique such as evaporation. The one electrode 12 is formed on the whole surface and the other electrode 16 is arranged in dot form, whereby an EL element minimized in resistance by electrodes and having no unevenness of emission luminance can be provided. |
