| 摘要 |
PROBLEM TO BE SOLVED: To obtain both of adhesion and antireflection of an oblique vapor deposition film by using the same material of the oblique vapor deposition film for the first layer of an antireflection film having at least two layers. SOLUTION: An oblique vapor deposition film 3 is formed into a columnar structure which grows as tilted from the substrate surface by arranging the substrate 1 tilted to the entering direction of an optical material in a vapor deposition device. Further, a first layer 4 of an antireflection film is formed on the oblique vapor deposition film 3 by using the same material as for the oblique vapor deposition film 3. Then a second layer 5 is formed under antireflection conditions. For example, light of 795nm wavelength is used for the optical element, the substrate 1 consists of glass and Ta2 O5 is used to form the oblique vapor deposition film 3. A Ta2 O5 film of 97nm thickness and a SiO2 film of 136nm thickness are formed by vapor deposition for the first layer 4 and second layer 5, respectively. The adhesion between the oblique vapor deposition film 3 and the first layer 4 of the antireflection film is firm because these films consist of the same material. |
