发明名称 |
SUBSTRATE HOLDING TOOL, SEMICONDUCTOR MANUFACTURE DEVICE, CRYSTAL GROWTH METHOD AND SEMICONDUCTOR MANUFACTURE METHOD |
摘要 |
<p>PROBLEM TO BE SOLVED: To make a crystal growth temperature constant in spite of the number of the processing times of a crystal growth process and to precisely measure the temperature of a substrate for crystal growth. SOLUTION: A substrate holder 10A is constituted of metal with the high melting point such as molybdenum. The holder has a substrate holding part 11 being an area for holding the substrate for crystal growth of a semiconductor crystal and a substrate non-holding part 12 being an area which does not hold the pertinent substrate. The upper face of the substrate non-holding part 12 is covered by a polycrystalline substrate whose lattice mismatching rate with the crystal lattice of the substrate for crystal growth is within 10%.</p> |
申请公布号 |
JPH09298232(A) |
申请公布日期 |
1997.11.18 |
申请号 |
JP19960109133 |
申请日期 |
1996.04.30 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
OTSUKA NOBUYUKI;KITO MASAHIRO;ISHINO MASATO;MATSUI YASUSHI |
分类号 |
C30B25/12;C23C16/44;C23C16/458;C23C16/46;H01L21/20;H01L21/205;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 |
主分类号 |
C30B25/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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