发明名称 Misted deposition method of fabricating layered superlattice materials
摘要 A precursor liquid comprising several metal 2-ethylhexanoates, such as stroritium tantalum and bismuth 2-ethylhexanoates, in a xylenes/methyl ethyl ketone solvent is prepared, a substrate is placed within a vacuum deposition chamber, the precursor liquid is misted, and the mist is flowed into the deposition chamber while maintaining the chamber at ambient temperature to deposit a layer of the precursor liquid on the substrate. The liquid is dried, baked, and annealed to form a thin film of a layered superlattice material, such as strontium bismuth tantalate, on the substrate. Then an integrated circuit is completed to include at least a potion of the layered superlattice material film in a component of the integrated circuit.
申请公布号 US5688565(A) 申请公布日期 1997.11.18
申请号 US19950480477 申请日期 1995.06.07
申请人 SYMETRIX CORPORATION 发明人 MCMILLAN, LARRY D.;PAZ DE ARAUJO, CARLOS A.;SCOTT, MICHAEL C.
分类号 C23C4/12;C23C16/44;C23C16/448;C23C16/455;C23C16/46;C23C16/48;C23C16/52;C23C18/12;C23C18/14;C30B7/00;H01C7/10;H01L21/02;H01L21/314;H01L21/316;H01L27/108;H01L27/115;H05K3/10;(IPC1-7):B05D3/00 主分类号 C23C4/12
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