| 发明名称 |
Process for reacting dissociated zircon with gaseous hydrogen fluoride |
| 摘要 |
A process for treating dissociated zircon comprises reacting dissociated zircon with gaseous hydrogen fluoride at an elevated reaction temperature. The reaction temperature is controlled to obtain at least one desired zirconium-based compound and at least one desired silicon-based compound.
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| 申请公布号 |
US5688477(A) |
申请公布日期 |
1997.11.18 |
| 申请号 |
US19950377425 |
申请日期 |
1995.01.24 |
| 申请人 |
ATOMIC ENERGY CORPORATION OF SOUTH AFRICA LIMITED |
发明人 |
NEL, JONATHAN |
| 分类号 |
C01B33/107;C01B33/12;C01G25/02;C01G25/04;(IPC1-7):C01G25/00;C01B9/08;C01B11/00;C01B33/08 |
主分类号 |
C01B33/107 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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