| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive photoresist compsn. showing excellent performance such as sensitivity, resolution, heat resistance, film remaining rate, coating property and profile, and in particular showing excellent durability against a time-delay effect. SOLUTION: This compsn. contains an acid producing agent, a resin which is insoluble or hardly soluble with an alkali but becomes soluble with an alkali by the effect of an acid, and an unsatd. compd. selected fromα,β-unsatd carboxylates andα,β,α',β'-unsatd. ketones. Moreover, the compsn. may contain a basic org. compd., an electron donating material, etc. Thereby, a fine photoresist pattern with high accuracy which can be hardly influenced by the environment and has high sensitivity and excellent resolution and profile can be obtd. |
