| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a wiring pattern so as to improve yield by surely rounding only the edges of the wiring pattern without adding another process. SOLUTION: After forming an aluminum film 2, the aluminum film 2 is wet-etched using a resist pattern 4 as a mask. Then, at the time of removing the resist pattern 4, resist stripper containing monoethanolamine which etches the aluminum film 2 when containing water is used, the resist pattern 4 is removed by mixing pure water with the resist stripper in the second resist stripping bath of a resist stripping system, and at the same time, only the edge corners of the aluminum wiring pattern 5 are rounded by etching by masking with the resist pattern 4. |
