发明名称 |
RADIATION SENSITIVE RESIN COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin compsn. especially useful as a chemical amplification type resist excellent in the resolution of contact holes, cross-sectional shape and focus latitude. SOLUTION: This resin compsn. contains a polymer (A) having at least one kind of group selected from among substituents having acid-decomposable acetal, ketal and t-butyl groups, a radiation sensitive acid generating agent (B), an acetal deriv. and/or a ketal deriv. (C) having a phenolic hydroxyl group and a mol.wt. of <1,000 and an acid diffusion controlling agent (D). |
申请公布号 |
JPH09297396(A) |
申请公布日期 |
1997.11.18 |
申请号 |
JP19960134178 |
申请日期 |
1996.05.02 |
申请人 |
JAPAN SYNTHETIC RUBBER CO LTD |
发明人 |
TANABE TAKAYOSHI;SAKURAI AKIHIKO;NATSUME NORIHIRO;TSUJI AKIRA |
分类号 |
G03F7/004;C08K5/06;C08K5/10;C08K5/13;C08K5/15;C08K5/1545;C08K5/17;C08K5/20;C08K5/41;C08L25/18;C08L33/04;G03F7/039;H05K3/00;H05K3/46;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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