SPECTROPHOTOMETRIC ANALYSIS

摘要

Apparatus for spectrophotometric analysis of a material P in a container 16 by reflectance of a beam 4 applied to the material through aperture 11 in a primary mask 9. A restricted beam 12 resulting from the mask 9 is applied through a port 13 in an opaque secondary mask 10 to the material P. The beam 12 is wholly within the port 13 and radiation reflected from the material P passes through the port 13 to detectors 7 for analysis. The mask 10 defines by its port 13 an area on the base 17 of the container through which the beam 12 is applied to the material P and is not subjected to spurious reflections and refractions otherwise created by the container 16 between its base 17 and side wall 18. The container 16 may be spaced from the mask 10 and inclined relative thereto so that the mask 10 shields the top and bottom ends of the container 16. The invention also includes a conversion kit with masks 9 and 10 for fitting to existing spectrophotometers and an apparatus by which an array of containers 16 can be fed successively and automatically to overlie port 13 for analysis and thereafter removed.