| 摘要 |
PURPOSE:To make the interposition of a base film at the time of exposure unnecessary by incorporating acrylic resin having a prescribed acid value, an ethylenic unsatd. compd. contg. a specified deriv. and a photopolymn. initiator. CONSTITUTION:Acrylic resin (A) having 100-200mg KOH/g acid value, an ethylenic unsatd. compd. (B) partially contg. dipentaerythritol deriv. (B') represented by formula I and a photopolymn. initiator (C) are incorporated into a photosensitive resin compsn. In formula I, X is a group represented by formula II, Y is a group represented by formula III, each of R<1> and R<2> is H or CH3, m is 1 or 2, each of a and b is an integer of >=0 and a+b=6. The pref. weight ratio between the resin A and the compd. B is 75:25-55:45. The pref. amt. of the deriv. B' is 5-20pts.wt. per 100pts.wt. resin A. The adequate amt. of the initiator C is 0.5-10wt.% of the total amt. of the resin A and the compd. B. A deriv. represented by formula I (where m=2, a=6 and b=0) is desirably used as the deriv. B'. |
