发明名称 RECESSED COIL FOR GENERATING A PLASMA
摘要 A recessed coil for a plasma chamber in a semiconductor fabrication system is provided. Recessing the coil reduces deposition of material onto the coil which in turn leads to a reduction in particulate matter shed by the coil onto the workpiece.
申请公布号 WO9742648(A1) 申请公布日期 1997.11.13
申请号 WO1997US08008 申请日期 1997.05.08
申请人 APPLIED MATERIALS, INC. 发明人 SUBRAMANI, ANANTHA;FORSTER, JOHN;STIMSON, BRADLEY, O.;EDELSTEIN, SERGIO;GRUNES, HOWARD;TEPMAN, AVI;XU, ZHENG
分类号 H05H1/46;C23C14/35;C23C16/50;H01J37/32;H01J37/34;H01L21/203;H01L21/205;H01L21/285;(IPC1-7):H01J37/32 主分类号 H05H1/46
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