| 摘要 |
PURPOSE:To achieve a highly accurate alignment even if an off-axis alignment system is used by forming a recording means which provides a mark on a reticle at the peripheral part of a wafer. CONSTITUTION:A recording means (glass plate) 24 including a light-sensitive layer which is shifted by a stage means 5 along with a wafer 2 and an illumination means (reticle optic system) 6 for illuminating only a specific mark for forming a specific mark image on a reticle 1 at a light-sensitive layer of the recording means 24 through a projection optic system 3 are provided. Also, a detection means (off-axis microscope) 7 for detecting the specific mark image which is formed on the light-sensitive layer of the recording means 24 and a control means (CPU) 9 for controlling the move of the stage means 5 being based on information obtained by using a detection output of the detection means 7 are provided. Then, the recording means 24 provides a light-sensitive layer region which is wide enough for enabling a plurality of specific mark images to be formed without being overlapped, thus improving alignment accuracy of off-axis type. |
