PRODUCTION OF SELF MATCHING OUT TRIGGER TYPE PHASE REVERSAL MASK

摘要

PROBLEM TO BE SOLVED: To improve productivity and reliability by preventing the occurrence of undercut and misalignment in forming a light-shielding part of a self-matching outrigger type PSM(phase shift mask) and uniformly forming an auxiliary phase inversion part by self matching. SOLUTION: A resist layer 104' and an insoluble layer 106' are successively formed on a light-shielding part 102 to form a laminated part (process C). Phosphorus ion is injected into a transparent substrate 100 and the surface of the substrate in each ion-injected area 108 is selectively etched to form a main phase inversion part (d) and an auxiliary phase inversion part (e) (process D). Then the insoluble layer 106' and the resist layer 104' in the laminated part are removed (process E).