| 摘要 |
A projection lithographic system that operates within the deep ultraviolet to vacuum ultraviolet region of the spectrum and uses an all-reflective optical arrangement to project a reduced image of a lithographic mask onto a semiconductor wafer. The all-reflective optical arrangement includes from six to eight reflective surfaces wherein each of the reflective surfaces is aspheric, The reflective surfaces are disposed along a common optical axis and are arranged not to interfere with the path of light as the light travel from the lithographic mask to the semiconductor wafer.
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