| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a uniform emitter having high accuracy in such a manner as to correspond to the design value a focusing electrode by forming an opening extending from an uppermost electrode layer to a substrate, and forming an emitter electrode on the substrate inside an opening formed on a lowermost electrode layer. SOLUTION: An insulating layer 12 and a conductive electrode layer 13 are formed on a substrate 11. An opening is formed on the electrode 13, to expose the layer 12. This process is repeated at least once, thereby forming a laminated film composed of a second insulating layer 14 and a focusing electrode 15. Thereafter, an opening is formed from the uppermost electrode 15 down to the substrate 11. In this case, the insulating layer 12 is selectively etched by using the opening 25 formed on the electrode 13 as a mask. The opening 26 formed on the focusing electrode 15 is greater in size than the opening 25 formed on the electrode 13. Subsequently, a first sacrifying layer 30G is formed on the opening 26 formed on the electrode 13. An emitter electrode is formed on the substrate 11 inside of the opening 26 by using the layer 30G as a mask.</p> |
