| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an electrostatic chuck which is kept constant in attraction even if a wafer temperature is varied. SOLUTION: A first electrode plate 46, a second electrode plate 48, and a third electrode plate 50 all in flat plate-like shape are built in the dielectric body 42 of an electrostatic chuck 34, so as to be separate from the surface of the dielectric body 42 by different distances respectively. The dielectric body 42 is changed in temperature so as to change a wafer in temperature, and the electrodes are switched so as to nearly make up for an attraction variation in the chuck 34 due to a temperature change. By this setup, etching processes carried out at various temperatures can be continuously performed for a wafer in the same device while keeping the electrostatic chuck 34 constant in attraction.</p> |
