| 摘要 |
PROBLEM TO BE SOLVED: To control the accuracy of the pattern dimension in the longitudinal and lateral directions of a fine pattern to within the allowance and to suppress the increase in the pattern number to irreducible minimum by discriminating a part where the distance between adjacent patterns formed almost in the resolution limit region is smaller than a specified dimension, discriminating an edge part, and correcting the pattern to be wider than the one to be exposed. SOLUTION: The mask patterns to be exposed are inspected to judge whether the interval W between adjacent mask patterns is smaller than the resolution limit owing to the wavelength of light or not (a). If the interval W is smaller than the resolution limit, a new pattern having larger width than the original pattern is made to form (b). The mask pattern is inspected to judge whether the width of the mask pattern is smaller than the resolution limit owing to the wavelength of light or not. If the width is smaller than the resolution limit, the edge part of the pattern is separated from the original pattern and a new pattern having larger width than the original pattern is made to produce (c). |
