发明名称 |
Photoresist stripping compositions |
摘要 |
A non-aqueous negative photoresist stripping composition which consists essentially of about 40 to 80% by weight of an alkylnaphthalene solvent, about 5 to 20% by weight of an alkyl phenol which provides a corrosion inhibitory effect, about 5 to 20% by weight of a linear monoalkylbenzene sulfonic acid which is a surfactant and about 1 to 10% by weight of a dialkylbenzene sulfonic acid. There is further provided a process for removing coatings from a photoresist with the compositions of the invention. |
申请公布号 |
AU2535497(A) |
申请公布日期 |
1997.11.07 |
申请号 |
AU19970025354 |
申请日期 |
1997.03.20 |
申请人 |
ASHLAND INC. |
发明人 |
IRL E. WARD;FRANCIS W. MICHELOTTI |
分类号 |
C11D1/22;C11D3/18;C11D3/20;C11D3/34;G03F7/42 |
主分类号 |
C11D1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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