发明名称 HIGH ABSORBANCE/LOW REFLECTANCE FELTS WITH A PATTERN LAYER
摘要 An apparatus for making paper. The apparatus comprises a felt and a pattern layer joined to the felt. The felt has a relatively high UV absorbance. Such a high UV absorbance prevents the actinic radiation applied to cure the pattern layer from scattering when the radiation penetrates the surface of the pattern layer. By limiting the scattering of radiation beneath the surface of the pattern layer, extraneous cured pattern layer material is minimized in the regions of the felt where it is desired not to have pattern layer material.
申请公布号 WO9741304(A2) 申请公布日期 1997.11.06
申请号 WO1997US06910 申请日期 1997.04.25
申请人 THE PROCTER & GAMBLE COMPANY 发明人 AMPULSKI, ROBERT, STANLEY;TROKHAN, PAUL, DENNIS;OSTENDORF, WARD, WILLIAM;MARLATT, HENRY, LOUIS
分类号 D21F1/44;D21F1/00;D21F7/08;D21F11/00;D21H27/02 主分类号 D21F1/44
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