发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT STRUCTURE
摘要 <p>A photosensitive resin composition comprising at least one polymer selected among binder polymers and prepolymers, an ethylenically unsaturated compound, a radical generator which can generate free radicals when irradiated with an ultraviolet radiation having a wavelength of 300 to 400 nm, and an anthraquinone dye which develops a new vivid color by discoloration when irradiated with an ultraviolet radiation having a wavelength of 300 to 400 nm in the presence of the above radical generator. This composition can be advantageously utilized in the field of printing plates and resists, because it can form a photocured resin molding having image and non-image areas which are different from each other in color when irradiated with an ultraviolet radiation having a specified wavelength in a quantity exceeding a threshold value through a negative mask. Particularly, this composition makes it possible to produce a flexographic plate which is remarkably improved in the workability of registering necessary for mounting the plate on a plate cylinder as compared with the conventional plate wherein relief areas and non-image areas have color of the same series, because the present composition forms a plate wherein relief areas and non-image areas are different from each other in color and therefore well contrast with each other.</p>
申请公布号 EP0511403(B1) 申请公布日期 1997.11.05
申请号 EP19910919799 申请日期 1991.11.19
申请人 ASAHI KASEI KOGYO KABUSHIKI KAISHA 发明人 TAKAHASHI, KATSUHIRO
分类号 G03F7/004;G03F7/00;G03F7/029;G03F7/031;G03F7/105;(IPC1-7):G03F7/004 主分类号 G03F7/004
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