| 摘要 |
<p>A method of correcting a temperature probe reading in a thermal processing chamber (100) for heating a substrate (106), including the steps of heating the substrate (106) to a process temperature; using a first, a second and a third probe (150, 152, 151a) to measure the temperature of the substrate (106), the first and third probes (150, 151a) having a first effective reflectivity and the second probe (152) having a second effective reflectivity, the first probe (150) producing a first temperature indication, the second probe (152) producing a second temperature indication and the third probe (151a) producing a third temperature indication, and wherein the first and second effective reflectivities are different; and from the first and second temperature indications, deriving a corrected temperature reading for the first probe (150), wherein the corrected temperature reading is a more accurate indicator of an actual temperature of the substrate (106) than an uncorrected reading produced by both the first and second probes (150, 152). Thereafter, deriving a corrected temperature reading for the third probe (151a) by adjusting the temperature correction calculated for the first probe (150) according to the measured emissivity sensitivity associated with the environment of the third probe (151a) to provide a corrected temperature reading that is a more accurate indicator of an actual temperature of the substrate (106) in the environment of the third probe (151a). An apparatus for carrying out the method is also disclosed. <IMAGE></p> |
