COMPOSITION, PHOTOSENSITIVE COMPOSITION USING THE SAME, PHOTOSENSITIVE MATERIAL, PRODUCTION OF RELIEF PATTERN AND PRODUCTION OF POLYIMIDE PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a compsn., a photosensitive material, and a relief pattern having superior photosensitivity and shelf stability, and a polyimide pattern. SOLUTION: This compsn, constrains a dye compd. having adsorption at 420-600nm and a titanocene compd. represented by the formula (where each of R<3> to R<12> is H, halogen. 1-20C alkoxy or a heterocyclic group, separately).