| 摘要 |
PROBLEM TO BE SOLVED: To obtain stably sufficient discharge characteristics capable of impressing an effective electric field to a piezoelectric film by a method wherein the piezoelectric film on a diaphragm pressurizing ink and an electrode to the piezoelectric film are patterned in the same form. SOLUTION: A silicon substrate is used as a head base 1 forming an ink pressure chamber as an ink fountain. A thermally oxidized film 2 as a disphragm is formed, a common electrode 3 is formed on the thermally oxidized film 2, and a piezoelectric film 4 is formed thereon. Further, an upper electrode 5 is formed thereon. Then, negaresist 6 is applied onto the upper electrode 5. The negaresist 6 is exposed, developed, and baked at a required position of the piezoelectric film by masking to form a hardened resist. The upper electrode 5 and the piezoelectric film 4 are simultaneously collectively etched until the common electrode 3 is exposed with a dry etching device. Both are patterned in the same form by conforming to a required form which is formed by the negaresist 6. |
