| 摘要 |
PROBLEM TO BE SOLVED: To lessen a plasma etching electrode in cost by keeping it high in performance, by a method wherein a part of the electrode consumed by plasma is formed of metal silicon or glassy carbon, and the residual part of the electrode is formed of carbon material coated with glassy carbon. SOLUTION: A part 1 of a plasma etching electrode which is brought into contact with and consumed by plasma is formed of metal silicon or glassy carbon, and the residual part 2 of the electrode is formed of carbon material coated with glass carbon. Carbon material is coated with glassy carbon such as cellulose, furfuryl alcohol, phenolic resin, acetone, polycarbodiimide resin, furan resin, furfural resin, other thermosetting resins, or a mixture of them. A glassy carbon coating layer is set as thick as 500 to 0.1μm.
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