| 摘要 |
PROBLEM TO BE SOLVED: To reduce contamination of a substrate and deterioration of the thickness uniformity of the treated substrate as much as possible, enable elimination of the necessity of attachment/detachment of a cup cleaning jig and a dedicated space for storage thereof, and improve the cleaning capability with respect to a splash guard cup. SOLUTION: A regulating member 6 partly abutted against an outer peripheral edge of a substrate so as to regulate horizontal movement of the substrate, and a substrate supporting member 5 partly abutted against a lower side of the substrate so as to support the substrate, are provided on a rotary table 4 integrally provided on a rotation axis 3, thus constituting substrate holding means 7. On the lower part of the rotary table 4, a cup cleaning liquid supply section 20 for supplying a cleaning liquid onto an inner peripheral surface of a splash guard cup 9 from a cleaning liquid supply nozzle 15 is rotatably provided integrally with the rotary table 4. The splash guard cup 9 is displaced between a splash guard position where the splash guard cup 9 covers the outer periphery of the substrate and a cleaning position where the cleaning liquid from the cup cleaning liquid supply section 20 is supplied. Thus, the inner peripheral surface of the splash guard cup 9 may be cleaned while the rotary table 4 is rotated. |
