| 摘要 |
The device provides for exposing photo-resist to form an absorbent film, without fluorescence on a slab (100) of a CRT. It comprises a base (20) and a turning plate (40) with apertures (41) at predetermined intervals around the circumference and installed to rotate on the base. A system for projecting light (50,60,70) is installed on the base in correspondence with the respective openings (41). The light sources (50,60,70) each project light along the same trajectory as the electron beam to excite the red, blue and green fluorescent coatings respectively. The slab (100), mounted on the openings (41) of the rotating plate (40) is exposed in a sequential manner by the light sources, as the rotating plate turns, the movement being intermittent and controlled by a drive mechanism (30).
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