| 发明名称 |
DEVICE FOR TREATING SUBSTRATES IN A FLUID CONTAINER |
| 摘要 |
In a device for treating substrates (5) in a fluid container (1), a particularly uniform, laminar flow pattern throughout the container is obtained even when a fluid is rapidly fed in at a high flow rate by means of a nozzle system with several nozzles (7) for introducing a fluid.
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| 申请公布号 |
WO9740524(A1) |
申请公布日期 |
1997.10.30 |
| 申请号 |
WO1997EP01580 |
申请日期 |
1997.03.27 |
| 申请人 |
STEAG MICROTECH GMBH |
发明人 |
WEBER, MARTIN;OSHINOWO, JOHN |
| 分类号 |
B08B3/02;B01J19/26;B08B3/10;H01L21/00;H01L21/304;H01L21/306;(IPC1-7):H01L21/00 |
主分类号 |
B08B3/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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