发明名称 Method of manifacturing electron emitting device, electron source and image-forming apparatus using the same
摘要 <p>A surface conduction electron-emitting device has an electroconductive film including an electron-emitting region between a pair of electrode on a substrate. The electroconductive film is formed by producing a precursor film of an organic metal compound or complex thereof and then turning the precursor film into the electroconductive film by keeping the temperature of the film above the decomposition temperature of the organic metal compound or the complex thereof and applying a voltage to the film. A plurality of such electron-emitting devices are arranged on a substrate in a matrix or ladder-like manner to constitute an electron source. Such an electron source is used with an image-forming member disposed vis-a-vis the electron source to form an image-forming member.</p>
申请公布号 EP0803890(A1) 申请公布日期 1997.10.29
申请号 EP19970302856 申请日期 1997.04.25
申请人 CANON KABUSHIKI KAISHA 发明人 SHIBATA, MASAAKI
分类号 H01J1/316;H01J9/02;H01J31/12;(IPC1-7):H01J9/02;H01J1/30 主分类号 H01J1/316
代理机构 代理人
主权项
地址
您可能感兴趣的专利