发明名称 Composition for anti-reflection coating
摘要 <p>Disclosed herein is a composition for anti-reflection coating which comprises a perfluoroalkyl sulfonic acid, an organic amine, a polyvinyl pyrrolidone, a water-soluble alkylsiloxane polymer, and water. The composition is able to be an anti-reflection coating film which has a low refractive index, reduces the degree of forming insoluble layer, and does not generate fine particles and minute crystalline matters in its surface layer.</p>
申请公布号 EP0803776(A2) 申请公布日期 1997.10.29
申请号 EP19970105624 申请日期 1997.04.04
申请人 HOECHST JAPAN LIMITED 发明人 YOSHIDA, TAKEO;TANAKA, HATSUYUKI
分类号 G03F7/11;C09D5/00;C09D7/12;C09D137/00;C09D139/06;C09D183/04;C09D183/06;G03F7/004;G03F7/09;H01L21/027;(IPC1-7):G03F7/09 主分类号 G03F7/11
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