| 摘要 |
PROBLEM TO BE SOLVED: To obtain the subject new compound having high sensitivity to high energy line, capable of forming a pattern by development with an aqueous solution of an alkali, useful as a component for a chemical amplification positive type resist material suitable for fine processing technology. SOLUTION: This phenylmonoterpene hydrocarbon derivative is shown by formula I (X is a bifunctional or a trifunctional monoterpene hydrocarbon; R<1> to R<3> are each independently H, a straight-chain or branched-chain alkyl, a straight-chain or branched-chain alkoxy, an aryl, etc.; R<4> s are H or a group unstable with an acid and at least one of R<4> is a group unstable with an acid; (n) is an integer of 1-5; (j), (k) and (m) are each an integer of 0-4; n+j+k+m=5, (p) is 2 or 3) such as 2-(4-tert-butoxycarbonyloxyphenyl)-2- 4-(4-tert- butoxycarbonyloxyphenyl-4-methyl)cyclohenyl}propane. The compound of formula I is synthesized from a phenol derivative of formula II by a conventional method readily and inexpensively. |
