Photosensitive resin composition

摘要

To provide a water-developable photosensitive resin composition capable of forming a resist film that excels in hardness, heat resistance and water resistance. The photosensitive resin composition of this invention is characterized by containing an unsaturated epoxy ester compound which is obtained by reacting the remaining epoxy side group of a partially carboxylic acid-esterified unsaturated epoxy ester compound with an aliphatic tertiary amine in the presence of an alcoholic solvent to convert it into a quaternary ammonium salt.