| 摘要 |
In the present invention, a signal is input to a device by the device input apparatus, a trigger signal is input to the electron beam tester, and a wiring pattern of the layout obtained from design data is displayed on the display. A beam is applied onto a predetermined measurement point in the wiring while operating the device by the irradiation means, and the amount of secondary electrons emitted from the irradiated measurement point is detected by the detector. The potential at the measurement point, which corresponds to the amount of the secondary electrons detected, calculated from the calculation means (not shown), and the potential data obtained from this calculation is displayed being superimposed on the wiring pattern of the layout.
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