发明名称 |
Method of fabricating semiconductor device and semiconductor device fabricated thereby |
摘要 |
An Si-doped AlInAs layer and an intrinsic AlInAs layer are successively grown on a semi-insulating InP substrate in a molecular beam epitaxy chamber. The sample is then heat-treated in a nitrogen ambient at 400 DEG C. for 18 minutes so that electrical characteristics of the sample are deteriorated because of the infiltration of fluorine into the Si-doped AlInAs layer. The sample is then placed in the molecular beam epitaxy chamber and reheat-treated in an ultra-high vacuum at 400 DEG C. for seven minutes and the fluorine is removed.
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申请公布号 |
US5682045(A) |
申请公布日期 |
1997.10.28 |
申请号 |
US19950525175 |
申请日期 |
1995.09.08 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
HAYAFUJI, NORIO;YAMAMOTO, YOSHITSUGU |
分类号 |
H01L29/812;H01L21/285;H01L21/324;H01L21/335;H01L21/338;H01L29/778;(IPC1-7):H01L31/032 |
主分类号 |
H01L29/812 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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