发明名称 Photoempfindliches Beschichtungsmittel auf Basis von Polyimid
摘要 A photosensitive cover coating agent is obtained by mixing a polymer (A) comprising repeating units of the formula (I) <CHEM> wherein R<1> represents <CHEM> and and R<2> represents an aromatic and/or aliphatic hydrocarbyl group optionally interrupted with one or more of oxygen atoms, sulphur atoms, sulfone groups or silane groups; a compound (B) having two or more acryloyl groups or methacryloyl groups in one molecule which is an acrylate or methacrylate of a polyhydric aromatic and/or aliphatic alcohol optionally interrupted with one or more oxygen atoms; and a compound (C) of the formula (II) <CHEM> wherein Z represents a divalent aliphatic group or alicyclic group, R<3> represents a hydrogen atom, or a hydroxyl, carboxyl, amide or nitrile group, or an aliphatic, alicyclic, aromatic or araliphatic group containing from 1 to 10 carbon atoms and optionally containing an unsaturated group or a hydroxyl, carboxy, ether, amide, ester or a ketone group, and R<4> represents a hydrogen atom or a group -Z-R<3> ; compound (C) being present in an amount of from 0.01 to 0.80 molar equivalents based upon the compound (B) and the total quantity of (B) and (C) being 20 to 200 parts by weight based upon 100 parts by weight of (A); together with a photopolymerization initiator or a sensitizing agent (D) in an amount of 0.5 to 20 parts by weight based upon 100 parts by weight of (A).
申请公布号 DE69222276(D1) 申请公布日期 1997.10.23
申请号 DE1992622276 申请日期 1992.12.09
申请人 CHISSO CORP., OSAKA, JP 发明人 MASAKI, YOSHINORI, CHIBAKEN, JP;KUNIMUNE, KOUICHI, CHIBAKEN, JP;MAEDA, HIROTOSHI, YOKOHAMASHI, KANAGAWAKEN, JP
分类号 C08L79/08;C08F2/48;G03F7/004;G03F7/027;G03F7/031;G03F7/037;G03F7/038;H01L21/027;H05K3/28;(IPC1-7):G03F7/037 主分类号 C08L79/08
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