PHOTORESIST STRIPPING COMPOSITIONS

摘要

A non-aqueous negative photoresist stripping composition which consists essentially of about 40 to 85 % by weight of an alkylnaphthalene solvent, about 5 to 20 % by weight of an alkyl phenol which provides a corrosion inhibitory effect, about 5 to 20 % by weight of a linear monoalkylbenzene sulfonic acid which is a surfactant and about 1 to 10 % by weight of a dialkylbenzene sulfonic acid. There is further provided a process for removing coatings from a photoresist with the compositions of the invention.