PHOTOMASK FOR RESOLUTION MEASUREMENT OF EXPOSURE DEVICE

摘要

Disclosed is a photo-mask for measuring resolution of exposure equipment which can prevent a peeling phenomenon of an minute pattern being generated. The photo-mask prevents the peeling phenomenon of pattern for measuring the resolution of exposure equipment, wherein a predetermined pattern is formed to sequentially increase out of the center area, but the predetermined pattern is formed by connecting each other using a connection film. Thus, it is possible to prevent the peeling phenomenon for measuring the resolution of exposure equipment.