| 摘要 |
<p>PROBLEM TO BE SOLVED: To manufacture a field emission negative electrode, which has a small vertical angle of a tip and a small curvature radius by giving distribution of thickness to a reaction control film. SOLUTION: Sacrifice films 16a, 16b made of SiO2 are anisotropically deposited on sacrifice films 15a, 15b by CVD method or spattering. The sacrifice film 16a is deposited at a nearly even thickness on the top surface of the sacrifice film 15a, which is formed of two parts, and in a side surface, thickness thereof is formed thick in an upper part and gradually reduced toward a lower part. At a part of a back of an over-hang part, the sacrifice film 16a is not deposited or deposited very thin. The sacrifice film 16b is deposited on the sacrifice film 15b. Each side surface of the over-hang part, which is formed of two parts, contacts with each other at a lower part of the side surface by a reaction film 16c, of which volume is expanded.</p> |
