ATMOSPHERIC PRESSURE PLASMA PROCESSOR AND METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide an atmospheric pressure plasma processor and a method therefor capable of dramatically reducing floor space. SOLUTION: Plural substrates 1 are perpendicularly supported inside a carrier 20. Substrates 1 are taken out from the carrier 20 one by one by driving a take-out mechanism 40. One of substrates taken out from the carrier 20 is transferred between a guiding part of the take-out mechanism 40 and an adsorption table 60. The adsorption table 60 vacuum-adsorbs the substrate 1 and moves the substrate 1 in a vertical direction toward an atmospheric pressure plasma processing part 30 arranged at different position from the carrier 20 in the vertical direction. The substrate 1 supported by the adsorption table 60 is faced to the atmospheric pressure plasma processing part 30.