发明名称 Ferroelectric based capacitor for use in memory systems and method for fabricating the same
摘要 A ferroelectric based capacitor structure and method for making the same. The capacitor includes a bottom electrode having a layer of Pt in contact with a first layer of an ohmic material. The capacitor dielectric is constructed from a layer of lead zirconium titanate doped with an element having an oxidation state greater than +4. The top electrode of the capacitor is constructed from a second layer of ohmic material in contact with a layer of Pt. The preferred ohmic material is LSCO; although RuO2 may also be utilized. The capacitor is preferably constructed over the drain of an FET such that the bottom electrode of the capacitor is connected to the drain of the FET. The resulting capacitor structure has both low imprint and low fatigue.
申请公布号 US5679969(A) 申请公布日期 1997.10.21
申请号 US19960661597 申请日期 1996.06.11
申请人 RADIANT TECHNOLOGIES, INC. 发明人 EVANS, JR., JOSEPH T.;WOMACK, RICHARD H.
分类号 H01L21/02;H01L21/8246;H01L27/115;H01L29/92;(IPC1-7):H01L27/108;H01L29/76;H01L29/94;H01L31/62 主分类号 H01L21/02
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