发明名称 |
Tantalum and niobium reagents useful in chemical vapor deposition processes, and process for depositing coatings using the same |
摘要 |
Niobium and tantalum compounds suitable for use as chemical vapor deposition source reagents, and a process for depositing niobium- or tantalum-containing coatings using the compounds. The compounds have formulaM(OR1)x(R2-C(GH)-C-C(G)-R3)ywherein M is tantalum or niobium; G is oxygen or sulfur; and R1, R2, and R3 are independently selected hydrocarbyl, fluoroalkyl or alkoxy groups.
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申请公布号 |
US5679815(A) |
申请公布日期 |
1997.10.21 |
申请号 |
US19940307316 |
申请日期 |
1994.09.16 |
申请人 |
ADVANCED TECHNOLOGY MATERIALS, INC. |
发明人 |
KIRLIN, PETER S.;VAARTSTRA, BRIAN A.;GORDON, DOUGLAS;GLASSMAN, TIMOTHY E. |
分类号 |
C07F9/00;C23C16/18;C23C16/40;(IPC1-7):C07F9/00;C04B35/00 |
主分类号 |
C07F9/00 |
代理机构 |
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代理人 |
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地址 |
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