发明名称 |
FIB/SEM COMPOUNDED APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To carry out SEM(scanning electron microscope) observation of a cross section of a specimen which is processed with high precision by FiB (focused ion beam) processing while preventing charging up. SOLUTION: A means to radiate beam to an electrode is installed in a SEM apparatus 2 which accelerates and converges electrons to scan a specimen 4 and forms on observation image be secondary electrons and reflected electrons generated by the specimen 4. This compounded apparatus comprises a SEM apparatus part of which a normal SEM mode and a secondary electron generating mode by irradiation of the electrode can be selectively employed, an FIB apparatus part 1 having a scanning ion microscopic function to accelerate and converge ions 11 and scan the specimen 4 and form an observation image by secondary electron signals emitted out of the specimen 4 and a function to irradiate a defined region of the specimen 4 selectively with converged ions and process the specimen 4, and a specimen chamber part 3 to hold the specimen in vacuum and the FIB 1 and the SEM 2 are so arranged as to cross respective beam axes of the FIB 1 and the SEM 2 approximately at the same position of the same specimen. |
申请公布号 |
JPH09274883(A) |
申请公布日期 |
1997.10.21 |
申请号 |
JP19960081200 |
申请日期 |
1996.04.03 |
申请人 |
HITACHI LTD |
发明人 |
ONISHI TAKESHI;ISHITANI TORU |
分类号 |
H01J37/28;H01J37/256;H01J37/30;H01J37/305;H01L21/302;H01L21/3065;(IPC1-7):H01J37/305;H01L21/306 |
主分类号 |
H01J37/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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