发明名称 |
Method of forming GaAs/AlGaAs hetero-structure and GaAs/AlGaAs hetero-structure obtained by the method |
摘要 |
A method of forming GaAs/AlGaAs hetero-structure. The method includes the steps of preparing a GaAs substrate having a (411)A-oriented surface and setting the GaAs substrate inside a growth container with the (411)A surface being disposed as a surface to be deposited. The pressure inside the growth chamber is reduced and the GaAs substrate is heated up to a predetermined temperature to cause epitaxial growth of Ga, Al, As on the (411)A substrate and forming a GaAs/AlGaAs hetero-structure on the (411)A-oriented GaAs substrate.
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申请公布号 |
US5679179(A) |
申请公布日期 |
1997.10.21 |
申请号 |
US19950523806 |
申请日期 |
1995.09.05 |
申请人 |
KUBOTA CORPORATION |
发明人 |
HIYAMIZU, SATOSHI;SHIMOMURA, SATOSHI;OKAMOTO, YASUNORI |
分类号 |
H01L29/12;H01S5/32;H01S5/323;(IPC1-7):H01L29/04 |
主分类号 |
H01L29/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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