发明名称 Method of forming GaAs/AlGaAs hetero-structure and GaAs/AlGaAs hetero-structure obtained by the method
摘要 A method of forming GaAs/AlGaAs hetero-structure. The method includes the steps of preparing a GaAs substrate having a (411)A-oriented surface and setting the GaAs substrate inside a growth container with the (411)A surface being disposed as a surface to be deposited. The pressure inside the growth chamber is reduced and the GaAs substrate is heated up to a predetermined temperature to cause epitaxial growth of Ga, Al, As on the (411)A substrate and forming a GaAs/AlGaAs hetero-structure on the (411)A-oriented GaAs substrate.
申请公布号 US5679179(A) 申请公布日期 1997.10.21
申请号 US19950523806 申请日期 1995.09.05
申请人 KUBOTA CORPORATION 发明人 HIYAMIZU, SATOSHI;SHIMOMURA, SATOSHI;OKAMOTO, YASUNORI
分类号 H01L29/12;H01S5/32;H01S5/323;(IPC1-7):H01L29/04 主分类号 H01L29/12
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